Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9786015 | Optics Communications | 2005 | 10 Pages |
Abstract
Multimode effects in the free propagation region (FPR) of a silicon-on-insulator (SOI)-based etched diffraction grating (EDG) demultiplexer are analyzed. In a conventional design, the power coupled to the higher order modes is considerable, which introduces a significant excess loss and crosstalk. It is shown that the multimode effects in an SOI EDG demultiplexer are much more detrimental than in an arrayed waveguide grating demultiplexer. Several methods for reducing the multimode effects are discussed. In particular, a laterally tapered structure between the FPR and the input/output waveguides is proposed as a simple and effective method for reducing the power coupled to the higher order modes and consequently reducing the multimode effects. The taper width is optimized to minimize the crosstalk.
Keywords
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Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
Daoxin Dai, Sailing He,