Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9789615 | Physica E: Low-dimensional Systems and Nanostructures | 2005 | 5 Pages |
Abstract
Two methods were used to fabricate tungsten supertips by electron-beam-induced deposition using 200Â keV electrons. The first method is stationary deposition of self-standing tips. The smallest lateral size is less than 10Â nm with a rather low aspect ratio of tip. High aspect ratio (up to 30) can only be obtained at a big lateral size with a saturated root diameter of 60-65Â nm. The other method is scan deposition of self-supporting tip, with a root width of 7-10Â nm and a sharp apex in size of 3Â nm. Using this method a higher aspect ratio (more than 72) can be achieved at a smaller lateral size, which is better to fabricate fine supertips for usage.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
Z.Q. Liu, K. Mitsuishi, K. Furuya,