Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9789704 | Physica E: Low-dimensional Systems and Nanostructures | 2005 | 5 Pages |
Abstract
Effects of the electrochemical deposition conditions on the properties of ZnO polycrystalline thin film were investigated, including the applied voltages, the deposition time and annealing treatment. X-ray diffraction and atomic force microscope measurements were performed to characterize the ZnO films. The results showed that the films were polycrystalline with hexagonal wurtzite-type structure and presented different morphologies, grain size ranging approximately from 180 to 320Â nm. ZnO films obtained at â0.9 and â1.0Â V were compact and homogeneous, and the transmittance was close to 95% at the wavelength of 500Â nm.
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Authors
Yongjun Zhang, Jian Weng, Yu Zhang, Ling Xu, Jun Xu, Xinfan Huang, Kunji Chen,