| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 9809413 | Surface and Coatings Technology | 2005 | 4 Pages |
Abstract
The application of plasma treatment on transparent PMMA substrates has shown an effect of reducing surface reflection. This effect is based on a refractive index gradient created by a combination of chemical decomposition and physical etching on the polymer surface. A stochastic nanostructure was found by means of AFM and SEM. Conditions for the plasma treatment process and properties of the modified PMMA surfaces have been discussed.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Antje Kaless, Ulrike Schulz, Peter Munzert, Norbert Kaiser,