| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 9809589 | Surface and Coatings Technology | 2005 | 6 Pages |
Abstract
The effect of Pt film thickness on the formation of platinum silicide (PtSi) phase, distribution of silicides, and surface morphology of PtSi/Si films was investigated with X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD) and atomic force microscopy (AFM). It was shown that when the film structure was changed from PtSi/Si to Pt/Pt2Si+PtSi/PtSi/Si, the film morphology changed from a smooth surface to a coarse columnar structure with the increase of the Pt film thickness.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Jinghua Yin, Wei Cai, Yufeng Zheng, Liancheng Zhao,