Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9809691 | Surface and Coatings Technology | 2005 | 4 Pages |
Abstract
This paper reports on ionization of sputtered zirconium (Zr) atoms in inductively coupled argon discharge. A Zr+ ion flux fraction to overall Zr species mainly was obtained by deposition measurements with the retarding bias method, and the fraction approximately reached â¼100%. The Zr+ ion fraction was affected by the discharge pressure, and hardly dependent on the discharge power corresponding to an electron density. This result suggested that the Zr+ ions were generated with ionization process other than electron impact such as Penning effect. There was an optimal pressure to produce the Zr+ ions, and the Zr+ ion density estimated from the deposition measurement was consistent with that obtained from a combination of Langmuir probe measurements and mass spectroscopic measurements.
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Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Keiji Nakamura, Hiroaki Yoshinaga, Ken Yukimura,