Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9809693 | Surface and Coatings Technology | 2005 | 5 Pages |
Abstract
Using ERTOF, it was found that the GCIB consisted of two components; small sized clusters with low kinetic energy and large sized clusters with high kinetic energy. It was also noted that the depth to which a substrate, on which the cluster beam impinged, was etched increased with the proportion of large clusters to the GCIB, since the small clusters, resulting from disintegration of large sized clusters by collisions with monomer ions, fast neutrals and residual gas molecules, have too low a kinetic energy to remove atoms from the surface. Note that the etched depth was affected by both the energy and size distribution of cluster ions. Therefore, ERTOF measurement could be utilized to assure the reproducibility of processes for the manufacture of semiconductors and magnetic recording heads.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Shigeru Kakuta, Toshio Seki, Shinji Sasaki, Kenji Furusawa, Takaaki Aoki, Jiro Matsuo,