Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9809724 | Surface and Coatings Technology | 2005 | 5 Pages |
Abstract
We have built an industrial 100-keV ion implanter for treating metal parts in order to increase wear resistance. 70-keV N ions of >5Ã1016/cm2 were implanted into the surface polished stainless steel 420 (SS420) with average surface roughness (Ra) of 0.04 μm, and wear resistance of N-ion-implanted specimen at the mild abrasive condition was investigated. When the beam incidence was 45° with respect to the specimen surfaces, nitrogen was detected up to at least 300 nm from the surface, as measured with Auger electron spectroscopy (AES). X-ray photoelectron spectroscopy (XPS) analysis showed that the implanted N formed mostly Cr2N without postirradiation annealing. Hardness profiles of the specimens were obtained with nanoindentation technique as a function of distance from the surface before and after ion implantations. The peak hardness of 14 Gpa formed at approximately 50-nm depth from the N-ion-implanted surface was about at least two times higher than nonirradiated specimen. Along with the hardness measurement, ball-on-disc wear resistance test was conducted with 500-gf alumina ball. The wear track to the onset point of abrupt increase in the frictional coefficient was about 5 m for the N-implanted specimen, while wear took place for the pristine sample as soon as the test started. On the other hand, when 1000-gf ball was used for the wear test, the difference in the wear track between the pristine and N implanted specimens was smaller than 500-gf ball. After the ion-beam irradiation, the surface roughness was reduced from Ra=0.04 μm to Ra=0.02, μm as measured with a high-resolution surface roughness tester. We found that the ion implantation prolonged the lifetime of the metal parts subjected to mild abrasive environment, like hair clipper blades.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
J.H. Lee, J.W. Park, J.S. Lee, C.W. Sohn, J.K. Kil,