| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 9809798 | Surface and Coatings Technology | 2005 | 5 Pages |
Abstract
Recent progresses in both fundamentals and technology of pulse biased arc ion plating (PBAIP) are described. They scope from thermodynamic nature of deposition technology to low temperature plasma physical features. The later includes plasma sheath, dust particles and electromagnetic analysis of pulse biased arc ion plating circuit.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
L.S. Wen, R.F. Huang,