Plasma-ion beam source enhanced deposition system

An advanced deposition system, plasma-ion beam source enhanced deposition system, is introduced. This equipment is composed of metal ion implantation source, gas ion implantation source, magnetron sputtering source, planar plasma source, hot filament plasma source and magnetic filtered cathode arc source. The metal implantation source and the gas implantation source are working with cathode arc and magnetron sputtering simultaneously. Many kinds of duplex technologies of plasma enhanced deposition can be realized in this system. The characteristics of plasma sources are described. Some duplex hard coatings are prepared, such as metal-doped diamond-like carbon (DLC) films, nitriding-TiN films and hard coatings on bearing steel at low temperature. The performances of these films were studied. The results show that the processes can be widely used in industry.