| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 9812122 | Thin Solid Films | 2005 | 5 Pages |
Abstract
We formed a Zn3N2 film by potentiostatic electrolysis of a zinc electrode at 1.6 V (vs. Li+/Li) in a LiCl-KCl-Li3N melt at 673 K. From the X-ray diffraction analysis, the obtained film was found to be a single phase of Zn3N2. From the X-ray photoelectron spectroscopy analysis, in the outer surface of the film, small amounts of Zn(OH)2 and ZnO were observed, which are believed to form after electrolysis. As a result of reflectance measurement in the ultraviolet, visible and near infrared region, it was clarified that Zn3N2 has a direct band gap of 1.01 eV.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Kazuaki Toyoura, Hiroyuki Tsujimura, Takuya Goto, Kan Hachiya, Rika Hagiwara, Yasuhiko Ito,