Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9812145 | Thin Solid Films | 2005 | 4 Pages |
Abstract
In this paper, we studied the variation of surface properties of N+ ions-implanted ZnO films. The ZnO films deposited on K9 glass substrate by direct current reactive magnetron sputtering were firstly implanted with N+ ions and subsequently subjected to process by rapid thermal annealing (RTA) in N2 ambience. The crystallographic properties and surface morphology were examined by X-ray diffraction and atomic force microscopy, respectively. The implantation of N+ ions and RTA not only roughens the surface of ZnO films but also changes the conduction type from the n-type to weak p-type. The resistivity of ZnO films was measured by the four-point probe method and the variation of the conduction type was observed by cool-hot probe point. The resistivity of ZnO films subjected to RTA at 500â¼600 °C decreased about 6-9 orders of magnitude. The optical properties have no significant change.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Haiyan Wang, Xiaoyong Gao, Qiliang Duan, Jingxiao Lu,