| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 9812364 | Thin Solid Films | 2005 | 5 Pages |
Abstract
Laser crystallization of a-Si:H on PES, PET and AryLite⢠polymer substrates is reported. For each material, the glass transition temperature Tg and the coefficient of thermal expansion have been evaluated, to determine the optimum deposition and crystallization processes conditions. 1000-Ã
thick intrinsic amorphous silicon films have been deposited on the substrates by Plasma Enhanced Chemical Vapour Deposition in the temperature range of 120-250°C. Dehydrogenation and crystallization have been obtained by high energy (10 J) XeCl pulsed excimer laser. The irradiation conditions have been varied to study their influence on the electrical and optical properties of crystallized material. Structural characterization has been performed by X-ray Diffraction. Increasing the radiation energy densities up to 220 mJ/cm2 crystallites sizes up to 750 Ã
have been obtained.
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Authors
Antonio Imparato, Carla Minarini, Alfredo Rubino, Paolo Tassini, Fulvia Villani, Dario Della Sala, Eugenio Amendola, Marinus Kunst, Heinz-Christoph Neitzert, Salvatore Bellone,