| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 9812771 | Thin Solid Films | 2005 | 8 Pages |
Abstract
A new route was explored to produce Ti3SiC2-based thin coatings on carbonaceous substrates. This method combines low pressure-pulsed chemical vapor deposition (CVD) and reactive CVD, the gaseous phase being a mixture of SiCl4, TiCl4 and H2. It consists in depositing a pyrocarbon film on the substrate, converting C into SiC (or TiCx) and then converting this carbide into Ti3SiC2. Experiments and thermodynamic calculations were performed and compared. The films were investigated by X-ray diffraction and transmission electron microscopy. Several microstructures consisting of various combinations of Ti3SiC2, C, SiC, TiCx and TiSi2 were obtained.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
S. Jacques, H. Di-Murro, M.-P. Berthet, H. Vincent,