Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9812773 | Thin Solid Films | 2005 | 5 Pages |
Abstract
ZnO thin film was electrodeposited from an aqueous solution of Zn(NO3)2 at 65 °C on indium tin oxide (ITO)-covered glass substrates. Atomic force microscope and X-ray diffraction studies indicated that the obtained ZnO films were polycrystalline with hexagonal wurtzite-type structure. Various operating conditions were controlled, including the applied voltages, the deposition time and annealing treatment. According to applied conditions, ZnO films presented different morphologies, grain size ranging approximately from 180 to 320 nm. When depositions were carried out at â0.9 and â1.0 V, ZnO films were compact and homogeneous, and their transmittance was close to 95% at the wavelength of 500 nm. The variations in the band gap of ZnO films deposited under different conditions are also discussed.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Jian Weng, Yongjun Zhang, Guanqi Han, Yu Zhang, Ling Xu, Jun Xu, Xinfan Huang, Kunji Chen,