Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9812879 | Thin Solid Films | 2005 | 7 Pages |
Abstract
The target erosion profiles are expected from the ion current density distribution on the sputter target simulated by two-dimensional PIC-MCC magnetron plasma simulator, and these profiles are compared with the experimental results. We present a discussion about the optimum detection range for the quasi-steady state of magnetron plasma in PIC-MCC simulation. Macro/microfilm deposition simulator predicts the macrofilm uniformity over the wafer and the micro-deposition topography in the micro-holes. Finally, we present a new algorithm, which can generate an asymmetric angular flux distribution, based on Monte Carlo method for microfilm deposition simulation.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
U.H. Kwon, S.H. Choi, Y.H. Park, W.J. Lee,