| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 9812931 | Thin Solid Films | 2005 | 4 Pages |
Abstract
DLC thin films were prepared by radio frequency (RF) plasma-enhanced chemical vapor deposition (PECVD) method on silicon substrates using methane (CH4), hydrogen (H2) and gas mixture. We have checked the influence of varying RF power on DLC film. The Raman spectroscopy shows the diamond-like carbon (DLC) amorphous structure of the films. AFM images show the surface roughness of the DLC film decrease with increasing RF power. Also, the friction coefficients were investigated by atomic force microscope (AFM) in friction force microscope (FFM) mode.
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Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Won Seok Choi, Jinhee Heo, Ilsub Chung, Byungyou Hong,