Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9813052 | Thin Solid Films | 2005 | 7 Pages |
Abstract
Au/Ni80Fe20 and Au/Ni30Fe70 bilayer films obtained by electron beam evaporation and sputtering were annealed in a vacuum of 5Ã10â4 Pa from 100 to 350 °C for 15 and 30 min, respectively. Auger electron spectroscopy (AES) was used to analyze the composition inside the Au layers. X-ray diffraction (XRD) was used to analyze the structural characteristic of the bilayer films. The sheet resistance of the bilayer films was measured using four-point probe technique. No impurity such as carbon, nitrogen, oxygen, sulphur and chlorine was detected inside the Au layers. As the annealing temperature and time changed from 150 °C, 15 min to 350 °C, 30 min, the Ni atoms in the Au/Ni80Fe20 bilayer films diffuse preferentially into the Au layer while a significant diffusion of Fe atoms in the Au/Ni30Fe70 bilayer film into the Au layer was observed. The diffusion of Ni and/or Fe atoms into the Au layer results in an increase in the resistivity of the bilayer film. Large numbers of Ni atoms diffusing into the Au layer of the Au/Ni80Fe20 bilayer film result in a remarkable decrease in the lattice constant of the Au layer.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Yan Huang, Hong Qiu, Hao Qian, Fengping Wang, Liqing Pan, Ping Wu, Yue Tian, Xiaoling Huang,