Article ID Journal Published Year Pages File Type
9817398 Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 2005 7 Pages PDF
Abstract
In this work we have studied the generation of EUV light by a novel compact electron cyclotron resonance ion source (CECRIS). The EUV emission diagnostics of the ECR plasma was accomplished by means of a 1.5 m grazing incidence monochromator which was operated in a wavelength range of 4-90 nm under the condition of medium to high resolution to discriminate between spectra arising from different Xeq+ (q = 2-10) charge states. One of the major accomplishments of this study is assignment of numerous new optical transitions for xenon in the 10-80 nm range to create a database for further investigations. High resolution spectra were recorded in the 10-16 nm range confirming significant contributions from highly excited Xe10+ and Xe9+ ionic states. Major outcome of this work is that the Xe10+ ion emission with λ = 13.4 nm may occurs with such a simplified and compact ECR source. The EUV emission of this particular line is of great interest for lithography applications.
Related Topics
Physical Sciences and Engineering Materials Science Surfaces, Coatings and Films
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