| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 9817472 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2005 | 5 Pages |
Abstract
The term “P-beam writing” is used to describe the technique of using focused high energy proton microbeams for micro or nanofabrication applications. The P-beam technique can be used to rapidly fabricate three-dimensional, high aspect ratio microstructures in a variety of materials without the use of masks and it is proving to be a versatile lithographic method. Recent developments in the application P-beam writing of microstructures at the Louisiana Accelerator Center are presented.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Gary A. Glass, Bibhudutta Rout, Alexander D. Dymnikov, Richard R. Greco, Mithun Kamal, James R. Reinhardt, John A. Peeples,