| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 9817753 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2005 | 5 Pages |
Abstract
Gas cluster ion beams (GCIB) represent a powerful new tool for wafer processing. This paper will review the development status of GCIB equipment as pertains to semiconductor applications.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
M.E. Mack,