Article ID Journal Published Year Pages File Type
9817771 Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 2005 5 Pages PDF
Abstract
Low energy electron induced X-ray emission spectrometry (LEXES) is used to monitor dose sensitivity before and after annealing, secondary ion mass spectrometry (SIMS) is used to monitor the dose and profile sensitivity after anneal. AR-XPS was also used to monitor the native oxide thickness before and after annealing, and the oxidation state of arsenic.
Keywords
Related Topics
Physical Sciences and Engineering Materials Science Surfaces, Coatings and Films
Preview
Low energy electron induced X-ray emission spectrometry (LEXES) and secondary ion mass spectrometry (SIMS) sensitivity studies to ultra shallow arsenic implants
Authors
, , , , , , , , , ,