| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 9817784 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2005 | 5 Pages |
Abstract
This ultra-high mass resolution is usually unavailable to the ion implant community, however our 120° mass analyzing magnet and the extremely low emittance of the ion beam extracted from the ClusterIon® source coupled with a variable width beam defining aperture and variable width mass defining slits allow for superior mass resolution.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Dale Jacobson, Thomas Horsky, Wade Krull, Bob Milgate,