Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9818261 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2005 | 5 Pages |
Abstract
X-rays emitted from Ar17+, Fe24+ and Kr35+ ions of about 400 MeV/u transmitting through a thin Si crystal of about 20 μm thickness have been measured in a planar channeling condition and compared with those in a random incident condition. We have found that the X-ray yield from Ar17+ ions is larger for the channeling condition than for the random incidence, while those from Fe24+ and Kr35+ ions are rather smaller. Such tendencies are explained by considering the projectile dependences of excitation and ionization probabilities together with X-ray emission rates. A crude simulation has qualitatively reproduced these experimental results. When the crystal thickness is small, the X-ray yield is smaller in the channeling condition than in the random incident condition, because excitation is depressed. However, for thicker crystals, the X-ray yield is larger, since the survived population of projectile-bound electrons is larger due to small ionization probabilities under the channeling condition. This inversion occurs at a specific crystal thickness depending on projectile species. Whether the thickness of the used crystal is smaller or larger than the inversion thickness determines enhancement or depression of the X-ray yield in the channeling condition.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
C. Kondo, Y. Takabayashi, T. Muranaka, S. Masugi, T. Azuma T. Azuma, K. Komaki, A. Hatakeyama A. Hatakeyama, Y. Yamazaki, E. Takada, T. Murakami,