Molecular dynamics simulations of interactions of Ar and Xe ions with surface Cu clusters at low impact energies

Molecular dynamics simulations of sputtering of copper cluster, consisting of 27 Cu atoms, on a (0 0 0 1) graphite substrate were performed. Ar and Xe bombardment was calculated with ion energies from 100 to 400 eV. Ion energy losses in the target, angular and energy distributions of back scattered ions as well as sputtered Cu atoms and their sputtering yields were examined.