Estimation of amorphous silicon thin film density by optical methods

The film density of deposited films was estimated using three different approaches. In the first one, the density was estimated by using effective medium approximation (EMA) analysis of a long wavelength dielectric function. In particular, the basic and modified Maxwell-Garnett models were tested. The second set of values for density was obtained by analysis of stretching vibrations of Si-H bonds in the IR part of the spectrum, by using an earlier published method. The results of all methods applied are compared and their plausibility is discussed.