Article ID Journal Published Year Pages File Type
9821534 Vacuum 2005 10 Pages PDF
Abstract
The direct deposition of transparent conductive oxide films from loosely packed powder targets by pulsed magnetron sputtering is a novel, highly versatile technique for the deposition of this type of material.
Keywords
Related Topics
Physical Sciences and Engineering Materials Science Surfaces, Coatings and Films
Preview
The structure and properties of copper oxide and copper aluminium oxide coatings prepared by pulsed magnetron sputtering of powder targets
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