| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 9821614 | Vacuum | 2005 | 4 Pages |
Abstract
The subject of this contribution is a study of the application of laser-produced ion streams for implantation into different materials. The laser-produced plasma has been used as a source of ions with different charge states and with different kinetic energies for ion implantation into various materials: metals, polymers and semiconductors, in order to modify their properties. The implantation depth was measured using Rutherford backscattering spectroscopy (RBS).
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
M. RosiÅski, J. Badziak, F.P. Boody, S. Gammino, H. Hora, J. Krása, L. Láska, A.M. Mezzasalma, P. Parys, K. Rohlena, L. Torrisi, J. Ullschmied, J. WoÅowski, E. Woryna,