Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9829300 | Journal of Crystal Growth | 2005 | 12 Pages |
Abstract
Thin polycrystalline silicon films are attractive for the fabrication of active matrix liquid crystal displays. We propose the use of flash lamp annealing to crystallize amorphous silicon layers on glass substrates as a low-cost manufacturing route. In this process, amorphous silicon can be crystallized both by solid phase crystallization (SPC) and in the super lateral growth (SLG) regime. We present a thermal model which incorporates the phase transitions during annealing and we have shown that predictions from the model are in good agreement with experimental observations. In addition, the model is a valuable aid to optimizing the process conditions.
Keywords
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Condensed Matter Physics
Authors
M. Smith, R. McMahon, M. Voelskow, D. Panknin, W. Skorupa,