Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9829637 | Journal of Crystal Growth | 2005 | 6 Pages |
Abstract
On the basis of a conventional direct-current glow discharge plasma chemical vapor deposition (DC-PCVD), we succeeded in raising the deposition rate of diamond films to a large extent by increasing its discharge power. The maximum deposition rate reached about 20 μm/h. The quality of diamond films was also much improved. The maximum thermal conductivity of diamond films prepared by our process was 15.1 W/K cm. Diamond films with such high thermal conductivity can meet the need of many thermal management applications. In this paper, the influences of the deposition techniques on the characteristics of diamond films were studied experimentally from the viewpoint of discharge current.
Keywords
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Condensed Matter Physics
Authors
Yizhen Bai, Zengsun Jin, Xianyi Lv, Zhigang Jiang, Xuemei Han, Jiayu Wang, Hanhua Wu,