Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9829848 | Journal of Crystal Growth | 2005 | 5 Pages |
Abstract
GaN films and GaN/AlN super-lattice structures (SLs) grown by plasma-assisted molecular beam epitaxy (RF-MBE) on vicinal sapphire (0Â 0Â 0Â 1) substrates are characterized by various techniques. It is found that the surface morphologies of GaN films are greatly improved by using such kinds of substrates and well-ordered stepped GaN surfaces are realized by RF-MBE growth. The step feature changes from a monolayer step to a multi-layer macro-step morphology, depending on the vicinal angle. High-resolution X-ray diffraction (HRXRD) and photoluminescence results suggest the high structural and optical qualities of the GaN films. Cross-sectional transmission electron microscope observations illustrate the abrupt interface and good periodicity of GaN/AlN SLs, which agree well with the HRXRD results. It is promising that the vicinal substrate is a good choice for the high-quality III-nitride films and their heterostructure growth.
Keywords
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Condensed Matter Physics
Authors
X.Q. Shen, M. Shimizu, T. Yamamoto, Y. Honda, H. Okumura,