Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9830051 | Journal of Crystal Growth | 2005 | 7 Pages |
Abstract
Changes of morphology during the growth of ZnO on Al2O3 (0 0 0 1) substrates by metalorganic chemical vapor deposition (MOCVD) were investigated as a function of growth temperature (Tg). The morphology of ZnO changes dramatically with Tg. At very low growth temperatures of Tg⩽200 °C, no meaningful ZnO forms. At 200 °C380 °C, ZnO nanowires start to grow on top of a continuous ZnO layer. Both the nanoneedles and the nanowires are not only well aligned both in the out-of- and in the in-plane direction, but also show a very low density of crystalline defects. Our results suggest that Tg is one of the key processing parameters and need to be optimized in a narrow regime in order to grow a desired type of ZnO in MOCVD process.
Keywords
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Condensed Matter Physics
Authors
Jae Young Park, Dong Ju Lee, Young Su Yun, Jong Ha Moon, Byung-Teak Lee, Sang Sub Kim,