Article ID Journal Published Year Pages File Type
9830051 Journal of Crystal Growth 2005 7 Pages PDF
Abstract
Changes of morphology during the growth of ZnO on Al2O3 (0 0 0 1) substrates by metalorganic chemical vapor deposition (MOCVD) were investigated as a function of growth temperature (Tg). The morphology of ZnO changes dramatically with Tg. At very low growth temperatures of Tg⩽200 °C, no meaningful ZnO forms. At 200 °C380 °C, ZnO nanowires start to grow on top of a continuous ZnO layer. Both the nanoneedles and the nanowires are not only well aligned both in the out-of- and in the in-plane direction, but also show a very low density of crystalline defects. Our results suggest that Tg is one of the key processing parameters and need to be optimized in a narrow regime in order to grow a desired type of ZnO in MOCVD process.
Related Topics
Physical Sciences and Engineering Physics and Astronomy Condensed Matter Physics
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