Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9830082 | Journal of Crystal Growth | 2005 | 7 Pages |
Abstract
The effect of InxGa1âxAs (x=0.1, 0.2) asymmetric strain release layers (ASRLs) on the microstructural and the interband transition properties of InAs/GaAs quantum dots (QDs) grown by using molecular beam epitaxy (MBE) and atomic layer epitaxy was investigated by using high-resolution transmission electron microscopy (HRTEM) and photoluminescence (PL) measurements. When the thickness of the ASRL covering the QDs was increased in the range between 0 and 5Â nm, the PL peak corresponding to the interband transitions shifted to longer wavelengths due to strain relaxation. However, when the thickness of the ASRL was increased above approximately 7Â nm, the peak shifted to shorter wavelengths due to the local interdiffusion of In and Ga atoms between the InxGa1âxAs capping layer and the InAs QDs as a result of the localized strains in the InxGa1âxAs capping layer and the InAs QDs. These results provide important information on the tunable feasibility of the interband transitions in the InAs/GaAs QDs utilizing the InxGa1âxAs capping layer.
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Condensed Matter Physics
Authors
J.G. Lim, Y.J. Park, Y.M. Park, J.D. Song, W.J. Choi, I.K. Han, W.J. Cho, J.I. Lee, T.W. Kim, H.S. Kim, C.G. Park,