Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9830300 | Journal of Crystal Growth | 2005 | 5 Pages |
Abstract
The influence of mechanical polishing, chemo-mechanical polishing (CMP), as well as CMP and subsequent chemical etching on the properties of sapphire substrate surfaces has been studied. The sapphire substrates have been investigated by means of polarizing microscopy, atomic force microscopy (AFM), X-ray diffraction rocking curves (XRCs) and micro-Raman spectroscopy. The results show that CMP with subsequent chemically etching yields the best-quality sapphire substrate surfaces.
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Condensed Matter Physics
Authors
Yinzhen Wang, Shiliang Liu, Guanliang Peng, Shengming Zhou, Jun Xu,