Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9834208 | Journal of Magnetism and Magnetic Materials | 2005 | 4 Pages |
Abstract
The influence of low-energy argon bombardment with an ion energy of 30-70Â eV and normal incidence on the morphology of a 15-nm-thick Ni81Fe19 film on SiO2 has been studied at room temperature. Scanning tunneling microscope measurements show a reduction of the root-mean-square roughness of over 40%. For magnetic tunnel junctions prepared by involving ion-beam smoothing process, the Néel coupling is substantially reduced and measured by magneto-optic Kerr magnetometry.
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Condensed Matter Physics
Authors
P.A. Beck, B.F.P. Roos, S.O. Demokritov, B. Hillebrands,