Article ID Journal Published Year Pages File Type
9834208 Journal of Magnetism and Magnetic Materials 2005 4 Pages PDF
Abstract
The influence of low-energy argon bombardment with an ion energy of 30-70 eV and normal incidence on the morphology of a 15-nm-thick Ni81Fe19 film on SiO2 has been studied at room temperature. Scanning tunneling microscope measurements show a reduction of the root-mean-square roughness of over 40%. For magnetic tunnel junctions prepared by involving ion-beam smoothing process, the Néel coupling is substantially reduced and measured by magneto-optic Kerr magnetometry.
Related Topics
Physical Sciences and Engineering Physics and Astronomy Condensed Matter Physics
Authors
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