Magnetic properties of large aspect ratio Co dots electrodeposited on prestructured silicon substrates

A silicon substrate, pre-structured by focused ion beam (FIB), is used for selective electrodeposition of cylindrical cobalt nanodots with a large aspect ratio of depth to diameter of 2. These nanostructures are characterised by magnetic force microscopy (MFM) and ferromagnetic resonance (FMR). Cobalt dots grown in the pulsed mode are single domain in the remnant state with an easy magnetization perpendicular to the substrate. On the contrary, some of the dots grown, in the continuous mode, present a Co cap on top, which leads to the formation of magnetic vortices with an in-plane magnetization component.