Studies of ferromagnetic resonance line width during electrochemical deposition of Co films on Au(1Â 1Â 1)

In situ ferromagnetic resonance (FMR) measurements were performed during and after the electrochemical deposition of Co on Au(1 1 1)/mica substrates using classical three-electrode cell under potential control. The influence of an electrolytically deposited Cu cover layer was investigated by in situ FMR measurements. Prior to the Cu deposition a FMR line width as small as 15 mT was observed. With the Cu covering the crystalline distribution of the Co film is increased and the surface anisotropy is decreased, leading to an enlargement of the FMR line width by a factor of 2 and a change of the FMR line position and shape.