Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9837848 | Physica B: Condensed Matter | 2005 | 5 Pages |
Abstract
The extended X-ray absorption fine structure technique (EXAFS) in the reflection mode under specular and non-specular conditions was used for the ex situ investigation of a sputter-deposited thin copper film on a float glass substrate. We prove the existence of a fine structure similar to EXAFS, which can be observed in the region of diffusely scattered intensities. It is shown that this new technique is surface sensitive for grazing angles above the critical angle of total reflection and an even higher surface sensitivity with respect to conventional reflection mode EXAFS can be achieved.
Keywords
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Condensed Matter Physics
Authors
Patrick Keil, Dirk Lützenkirchen-Hecht, Ronald Frahm,