Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9841577 | Physica C: Superconductivity and its Applications | 2005 | 9 Pages |
Abstract
Pulsed electron deposition (PED), an ablation-based film growth technique similar to pulsed-laser deposition, is a relatively new method for the physical vapor deposition (PVD) of films. In the area of PVD ex situ superconductor precursor deposition, PED is potentially simpler and more versatile than its traditional e-beam co-evaporation counterpart. We have deposited near-stoichiometric YF3-BaF2-CuO PED precursors of various thicknesses in moving configuration on RABiTS substrates. Critical current densities (Jc) as high as 1.6Â MA/cm2 have been achieved on these precursors converted at standard slow rates of roughly 1Â Ã
/s, which has previously been necessary for high performance PVD precursors. More importantly, these as-deposited PED precursors were found to be able to tolerate aggressive conversion conditions. Consequently, simultaneous attainment of high conversion rate of nearly 8Â Ã
/s and high Jc of 1Â MA/cm2 has been realized.
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Condensed Matter Physics
Authors
D.F. Lee, H.M. Christen, F.A. List, L. Heatherly, K.J. Leonard, C.M. Rouleau, S.W. Cook, P.M. Martin, M. Paranthaman, A. Goyal,