Nano-resolution profiling of micro-structures using quantitative X-ray phase retrieval from Fraunhofer diffraction data

X-ray Fraunhofer diffraction data have been collected from a series of weakly thickness-modulated samples using a synchrotron source. Three different 10 μm wide areas of a linear Fresnel zone structure etched in a silicon wafer were studied. Each studied area included different number of zones, ranging from 6 to 20. Phase retrieval X-ray diffractometry technique was used for the experimental data analysis. The zone structure thickness profiles were mapped with a spatial resolution of 100 nm.