| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10376518 | Journal of Colloid and Interface Science | 2012 | 6 Pages |
Abstract
⺠Wafer corrosion during incubation in PBS at 37 °C is due to phosphate. ⺠Alteration of the PEO-silane layer is due to underneath dissolution of SiO2. ⺠Corrosion also occurs in NaHCO3 solution, due to the relatively high pH.
Related Topics
Physical Sciences and Engineering
Chemical Engineering
Colloid and Surface Chemistry
Authors
C.M. Dekeyser, C.C. Buron, S.R. Derclaye, A.M. Jonas, J. Marchand-Brynaert, P.G. Rouxhet,