| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10376576 | Journal of Colloid and Interface Science | 2012 | 5 Pages |
Abstract
⺠We present a new pitch reduction lithographic technique by selective wetting. ⺠A meniscus was exploited to reduce the feature size of original line pattern. ⺠The line width was controllable by concentration and ashing time. ⺠The pattern shape was reconfigurable under different reflow conditions.
Related Topics
Physical Sciences and Engineering
Chemical Engineering
Colloid and Surface Chemistry
Authors
Hyung Sik Um, Jae Joon Chae, Sung Hoon Lee, Yudi Rahmawan, Kahp Y. Suh,