| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10376846 | Journal of Colloid and Interface Science | 2012 | 9 Pages |
Abstract
⺠Generating a density adjustable AuNP self-assembly layer onto the Si surface. ⺠Self-assembled AuNP layer is patterned as 200 nm resolution line by lithography. ⺠Si nanopillars featured high density and aspect ratio are generated by AuNP mask. ⺠We fabricate Si nanopillar array as 200 nm resolution line patterns on the surface.
Keywords
Related Topics
Physical Sciences and Engineering
Chemical Engineering
Colloid and Surface Chemistry
Authors
Jem-Kun Chen, Jia-Qi Qui, Shih-Kang Fan, Shiao-Wei Kuo, Fu-Hsiang Ko, Chih-Wei Chu, Feng-Chih Chang,