Article ID Journal Published Year Pages File Type
10377631 Journal of Colloid and Interface Science 2005 10 Pages PDF
Abstract
The influence of ruthenium and osmium spontaneous deposition on polycrystalline platinum in sulfuric acid was studied by conventional electrochemical techniques. The inhibition of the hydrogen adatom voltammetric profile by the foreign adatoms was used to calculate the degree of surface coverage of ruthenium, osmium, and a mixture of both metal ions from solutions of different composition. Methanol adsorption and oxidation were compared on bare platinum, platinum/ruthenium, platinum/osmium, and ternary compounds, considering the efficiency of methanol oxidation per hydrogen adatom displaced by the foreign metal on platinum.
Related Topics
Physical Sciences and Engineering Chemical Engineering Colloid and Surface Chemistry
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