| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10401220 | Diamond and Related Materials | 2005 | 4 Pages |
Abstract
In this paper, a novel direct current glow discharge plasma chemical vapor deposition (DC-PCVD) process, i.e., hot cathode DC-PCVD, is employed to deposit diamond films on molybdenum substrate. Compared with the conventional DC-PCVD method, the hot cathode DC-PCVD process is distinctive for its hot cathode with the temperature ranging from 700 to 1600 °C. Detailed experiments and analyses showed that the cathode temperature plays a key role in the stabilization of gas discharge and growth of diamond films.
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Electrical and Electronic Engineering
Authors
Yizhen Bai, Zengsun Jin, Xianyi Lv, Zhigang Jiang, Jiayu Wang, Hanhua Wu,