Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10401223 | Diamond and Related Materials | 2005 | 5 Pages |
Abstract
Composition of the microwave plasma in chemical vapor deposition (CVD) of diamond in the low pressure range (25 mbar) is reported, using in situ mass spectrometry (MS) in a novel way, to reduce the possibility of recombination for radicals during the sampling process. While the general trends, observed earlier for increasing methane content of the gas feed, are reproduced, it is shown that the relative amount of radicals (most of all CH3 and C2H) is substantially higher than reported before. In fact their total concentration is at least equal to that of the most abundant stable species, C2H2.
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Engineering
Electrical and Electronic Engineering
Authors
A. Kováts, P. Deák,