| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10578778 | Polyhedron | 2005 | 6 Pages |
Abstract
Low pressure chemical vapour deposition of [NbCl3(NSiMe2Ph)(NH2SiMe2Ph)]2 and [TaCl3(NSiMe3)(NC5H3Me2-3,5)2] forms thin films of niobium and tantalum nitride, respectively, at 600 °C.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Inorganic Chemistry
Authors
Jenelle E. Bleau, Claire J. Carmalt, Shane A. O'Neill, Ivan P. Parkin, Andrew J. P. White, David J. Williams,