Article ID Journal Published Year Pages File Type
10631076 Journal of Non-Crystalline Solids 2012 6 Pages PDF
Abstract
► Amorphous SiNX:H thin films were grown using plasma enhanced chemical vapor deposition. ► Growth rate, optical and chemical bonding characteristics of SiNX:H thin films were studied. ► Rapid thermal processing caused changes in microstructural and optical properties of SiNX:H.
Keywords
Related Topics
Physical Sciences and Engineering Materials Science Ceramics and Composites
Preview
Optical properties and chemical bonding characteristics of amorphous SiNX:H thin films grown by the plasma enhanced chemical vapor deposition method
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