| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10631156 | Journal of Non-Crystalline Solids | 2012 | 8 Pages |
Abstract
⺠In depth analysis of remote-plasma deposited μc-Si:H films is presented. ⺠The poor μc-Si:H film quality is linked to an insufficient amount of a-Si:H tissue. ⺠It has been investigated whether atomic H is responsible. ⺠H-induced etching of a-Si:H tissue does not compete with μc-Si:H film growth. ⺠Nor does hydrogen incorporation lead to an increased a-Si:H film porosity.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
A.C. Bronneberg, M.C.M. van de Sanden, M. Creatore,