| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10631181 | Journal of Non-Crystalline Solids | 2012 | 6 Pages |
Abstract
⺠Thin films of a-Ge:H deposited at high growth rate by rf glow discharge. ⺠Effect of CH and the hydrogen-bonding configuration on the structural and on the optoelectronic properties. ⺠When the film thicknesses d increase, the ND and the R decrease gradually. ⺠The remarkable improvement is attributed to the increase of H incorporated as the strongly Ge-H bonds.
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
Abdelkader Belfedal, Yahya Bouizem, Jamal Dine Sib, Larbi Chahed,